3D nanoprinting of semiconductor quantum dots by photoexcitation-induced chemical bonding

Author:

Liu Shao-Feng1ORCID,Hou Zheng-Wei2ORCID,Lin Linhan1ORCID,Li Fu3ORCID,Zhao Yao1ORCID,Li Xiao-Ze1ORCID,Zhang Hao3ORCID,Fang Hong-Hua1ORCID,Li Zhengcao2ORCID,Sun Hong-Bo14ORCID

Affiliation:

1. State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Haidian, Beijing 100084, China.

2. Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Haidian, Beijing 100084, China.

3. Department of Chemistry, Tsinghua University, Haidian, Beijing 100084, China.

4. State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China.

Abstract

Three-dimensional (3D) laser nanoprinting allows maskless manufacturing of diverse nanostructures with nanoscale resolution. However, 3D manufacturing of inorganic nanostructures typically requires nanomaterial-polymer composites and is limited by a photopolymerization mechanism, resulting in a reduction of material purity and degradation of intrinsic properties. We developed a polymerization-independent, laser direct writing technique called photoexcitation-induced chemical bonding. Without any additives, the holes excited inside semiconductor quantum dots are transferred to the nanocrystal surface and improve their chemical reactivity, leading to interparticle chemical bonding. As a proof of concept, we printed arbitrary 3D quantum dot architectures at a resolution beyond the diffraction limit. Our strategy will enable the manufacturing of free-form quantum dot optoelectronic devices such as light-emitting devices or photodetectors.

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

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