Isolation of an Intrinsic Precursor to Molecular Chemisorption-Reference-Cited by-同舟云学术

Isolation of an Intrinsic Precursor to Molecular Chemisorption

Published:1998-01-23 Issue:5350 Volume:279 Page:542-544
ISSN:0036-8075
Container-title:Science
language:en
Short-container-title:Science

Author:

Brown David E.¹,Moffatt Douglas J.¹,Wolkow Robert A.¹

Affiliation:

1. National Research Council of Canada (NRCC), Steacie Institute for Molecular Sciences, 100 Sussex Drive, Ottawa, Ontario K1A 0R6, Canada.

Abstract

Over the past 70 years, numerous gas-surface adsorption studies have indicated the existence of a weakly bound, mobile intermediate that is a precursor to chemical bond formation. The direct observation and characterization of such a species are presented. Precursor and chemisorbed benzene on a silicon surface were clearly distinguished with the use of a tunable-temperature scanning tunneling microscope. Precursor decay to chemisorption was observed, allowing the salient features of the potential energy surface to be determined.

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

Reference54 articles.

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2. Lennard-Jones J. E., Trans. Faraday Soc. 18, 333 (1932).

3. For reviews of these studies see D. A. King in Critical Reviews in Solid State and Materials Sciences D. E. Schuele and R. W. Hoffman Eds. (CRC Press Boca Raton FL 1978) vol. 7 pp. 167-208

4. C. R. Arumainayagam and R. J. Madix Molecular Beam Studies of Gas-Surface Collision Dynamics S. G. Davison Ed. vol. 38 of Progress in Surface Science (Pergamon New York 1991).

5. Taylor J. B., Langmuir I., Phys. Rev. 44, 423 (1933).

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