Wafer-Scale Growth of Single-Crystal Monolayer Graphene on Reusable Hydrogen-Terminated Germanium

Author:

Lee Jae-Hyun123,Lee Eun Kyung4,Joo Won-Jae34,Jang Yamujin23,Kim Byung-Sung13,Lim Jae Young13,Choi Soon-Hyung23,Ahn Sung Joon5,Ahn Joung Real15,Park Min-Ho2,Yang Cheol-Woong2,Choi Byoung Lyong4,Hwang Sung-Woo34,Whang Dongmok123

Affiliation:

1. SKKU Advanced Institute of Nanotechnology, Sungkyunkwan University (SKKU), Suwon 440-746, Korea.

2. School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 440-746, Korea.

3. Research Center for Time-Domain Nano-functional Devices, Samsung Advanced Institute of Technology, Yongin 449-712, Korea.

4. Nano Electronics Laboratory, Samsung Advanced Institute of Technology, Yongin 449-712, Korea.

5. Department of Physics, Sungkyunkwan University, Suwon 440-746, Korea.

Abstract

Smoothing Graphene Several methods have been reported for the growth of monolayer graphene into areas large enough for integration into silicon electronics. However, the electronic properties of the graphene are often degraded by grain boundaries and wrinkles. Lee et al. (p. 286 , published online 3 April) showed that flat, single crystals of monolayer graphene can be grown by chemical-vapor deposition on silicon wafers covered by a germanium layer that aligns the grains. The graphene can be dry-transferred to other substrates, and the germanium layer can be reused for further growth cycles.

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

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