Spin coating epitaxial films

Author:

Kelso Meagan V.1ORCID,Mahenderkar Naveen K.1ORCID,Chen Qingzhi2ORCID,Tubbesing John Z.2ORCID,Switzer Jay A.2ORCID

Affiliation:

1. Department of Materials Science and Engineering and Graduate Center for Materials Research, Missouri University of Science and Technology, Rolla, MO 65409-1170, USA.

2. Department of Chemistry and Graduate Center for Materials Research, Missouri University of Science and Technology, Rolla, MO 65409-1170, USA.

Abstract

Epitaxial films through spin coating A simple way to coat a surface with a uniform film is by spin coating. The substrate is spun at high speed, and a droplet of solution containing the coating is added at the center, spreads out, and evaporates. This method is used to make polycrystalline inorganic coatings and amorphous films, such as polymers used in lithography. Kelso et al. performed spin coating with single-crystal substrates, carefully controlling the thickness of the spreading solution on the basis of its viscosity and the rotation rate. In this way, they achieved epitaxial growth—in which the crystallites are oriented by the substrate—for perovskites, zinc oxide, and sodium chloride. Science , this issue p. 166

Funder

U.S. Department of Energy

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

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