Controlled crack propagation for atomic precision handling of wafer-scale two-dimensional materials

Author:

Shim Jaewoo12ORCID,Bae Sang-Hoon12,Kong Wei12,Lee Doyoon12ORCID,Qiao Kuan12,Nezich Daniel3ORCID,Park Yong Ju4ORCID,Zhao Ruike15,Sundaram Suresh6,Li Xin6,Yeon Hanwool12ORCID,Choi Chanyeol12ORCID,Kum Hyun12ORCID,Yue Ruoyu7ORCID,Zhou Guanyu7ORCID,Ou Yunbo8ORCID,Lee Kyusang129ORCID,Moodera Jagadeesh8,Zhao Xuanhe1,Ahn Jong-Hyun4ORCID,Hinkle Christopher710ORCID,Ougazzaden Abdallah6,Kim Jeehwan121112

Affiliation:

1. Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.

2. Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, USA.

3. Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, MA, USA.

4. School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea.

5. Department of Mechanical and Aerospace Engineering, The Ohio State University, Columbus, OH, USA.

6. School of Electrical and Computer Engineering, Georgia Institute of Technology, UMI 2958 GT-CNRS, GT-Lorraine, Metz, France.

7. Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, USA.

8. Department of Physics, and Plasma Science and Fusion Center, Massachusetts Institute of Technology, Cambridge, MA, USA.

9. Departments of Electrical and Computer Engineering and Materials Science Engineering, University of Virginia, Charlottesville, VA, USA.

10. Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN, USA.

11. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.

12. Microsystem Technology Laboratory, Massachusetts Institute of Technology, Cambridge, MA, USA.

Abstract

Cleaving with a metal handle Using adhesive tape to pull off monolayers of two-dimensional (2D) materials is now a well-established approach. However, the flakes tend to be micrometer scale, and the creation of multilayer stacks for device application can be challenging and time consuming. Shim et al. show that monolayers of a variety of 2D materials, including molybdenum disulfide and hexagonal boron nitride, can be cleaved from multilayers grown as 5-centimeter-diameter wafers. The multilayer is capped with a nickel layer, which can be used to pull off the entire grown stack. The bottom of the stack is again capped with nickel, and a second round of cleaving leaves the monolayer on the bottom nickel layer. The monolayers could be transferred to other surfaces, which allowed the authors to make field-effect transistors with high charge-carrier mobilities. Science , this issue p. 665

Funder

National Science Foundation

Office of Naval Research

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

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