Atomic gold–enabled three-dimensional lithography for silicon mesostructures

Abstract

Complex shapes from chemical lithography Lithographic printing of semi-conductors builds up complex patterns one layer at a time. The process involves multiple steps to mask, print, and etch each layer. Luo et al. tweaked the same process used to grow silicon nanowires to pattern them into complex three-dimensional (3D) shapes. Gold acted as a catalyst to grow and elongate silicon nanowires from the vapor phase. Varying the pressure of the growth process altered the rate of gold diffusion along the surface of the wire. Upon etching the wires, the non-uniform coating of gold acted as a lithographic mask. The authors were thus able to make complex-shaped silicon spicules with a series of ridges and notches by strictly chemical means. Science , this issue p. 1451