Laser-Induced Chemistry for Microelectronics
Author:
Affiliation:
1. Professor of electrical engineering and applied physics at Columbia University, New York 10027.
2. Wellman Laboratory, Massachusetts General Hospital, Boston 02114.
Publisher
American Association for the Advancement of Science (AAAS)
Subject
Multidisciplinary
Reference44 articles.
1. ALLEN, S.D., LASER CHEMICAL VAPOR-DEPOSITION OF METALS AND INSULATORS, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY 16: 431 (1979).
2. Arikado, T., Laser Diagnostics and Photochemical Processing for Semiconductor Devices: 167 (1984).
3. BOYER, P.K., LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF SIO2, APPLIED PHYSICS LETTERS 40: 716 (1982).
4. Brewer, P., Laser Diagnostics and Photochemical Processing for Semiconductor Devices: 179 (1984).
5. BRUECK, SRJ, STIMULATED SURFACE-PLASMA-WAVE SCATTERING AND GROWTH OF A PERIODIC STRUCTURE IN LASER-PHOTODEPOSITED METAL-FILMS, PHYSICAL REVIEW LETTERS 48: 1678 (1982).
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