FILMS OF POSITIVE DIAZOQUINONE-NOVOLAC PHOTORESIST FP9120 IMPLANTED WITH SILVER IONS
Author:
Affiliation:
1. Euphrosyne Polotskaya State University of Polotsk
2. Belarusian State University
Publisher
Polotsk State University
Reference18 articles.
1. Moreau, W. M. (1988). Semiconductor Lithography: Principles, Practices, and Materials. N.Y.; London: Plenum Press.
2. Brinkevich, S. D., Grinyuk, E. V., Brinkevich, D. I., & Prosolovich, V. S. (2020). Modification of Diazoquinone–Novolac Photoresist Films beyond the Region of Implantation of B+ Ions. High energy chemistry, 54(5), 342–351. DOI: 10.1134/S0018143920050045.
3. Vabishchevich, S. A., Brinkevich, S. D., Vabishchevich, N. V., Brinkevich, D. I., & Prosolovich, V. S. (2021). Adhesion of Irradiated Diazoquinone-Novolac Photoresist Films to Single-Crystal Silicon. High Energy Chemistry, 55(6), 495–501. DOI: 10.1134/S0018143921060151.
4. Vabishchevich, S., Brinkevich, S., Prosolovich, V., Vabishchevich, N., & Brinkevich, D. (2020). Effect of Ion Implantation on the Adhesion of Positive Diazoquinone-Novolak Photoresist Films to Single-Crystal Silicon. Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques, 14(6), 1352–1357. DOI: 10.1134/S1027451020060476.
5. Kharchenko, A. A., Brinkevich, D. I., Prosolovich, V. S., Brinkevich, S. D., Odzaev, V. B., & Yankovski, Yu. N. (2020). Kharchenko, A. A. Radiation-Stimulated Transformation of the Reflectance Spectra of Diazoquinone–Novolac Photoresist Films Implanted with Antimony Ions. Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques, 14(3), 558–561. DOI: 10.1134/S1027451020030283.
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