Schottky Barrier Memory based on Heterojunction Bandgap Engineering for High-density and Low-power Retention

Author:

Kim Hyangwoo1,Kim Yijoon1,Oh Kyounghwan1,Park Ju Hong1,Baek Chang-Ki1

Affiliation:

1. Pohang University of Science and Technology (POSTECH)

Abstract

Abstract

Dynamic random-access memory (DRAM) has been scaled down to meet high-density, high-speed, and low-power memory requirements. However, conventional DRAM has limitations in achieving memory reliability, especially sufficient capacitance to distinguish memory states. While there have been attempts to enhance capacitor technology, these solutions increase manufacturing cost and complexity. Here, we propose a novel Schottky barrier memory (SBRAM) featuring a heterojunction based on bandgap engineering. SBRAM can be configured as vertical cross-point arrays, which enables high-density integration with a 4F2 footprint. In particular, the Schottky junction significantly reduces the reverse leakage current, preventing sneak current paths that cause leakage currents and readout errors during array operation. Moreover, the heterojunction physically divides the storage region into two regions, resulting in three distinct resistive states and inducing a gradual current slope to ensure sufficient holding margin. These states are determined by the holding voltage (Vhold) applied to the programmed device. When the Vhold is 1.1 V, the programmed state can be maintained with an exceptionally low current of 35.7 fA without a refresh operation.

Publisher

Research Square Platform LLC

Reference31 articles.

1. Capacitors with an equivalent oxide thickness of < 0.5 nm for nanoscale electronic semiconductor memory;Kim SK;Advanced Functional Materials,2010

2. Technology scaling challenge and future prospects of DRAM and NAND flash memory;Park SK;IEEE Int. Memory Workshop (IMW),2014

3. Technology scaling challenges and opportunities of memory devices;Lee SH;IEEE Int. Electron Devices Meeting (IEDM),2016

4. Future of dynamic random-access memory as main memory;Kim SK;Mater. Adv. Semicond. Mem,2020

5. Ultimate scaling of TiN/ZrO2/TiN capacitors: Leakage currents and limitations due to electrode roughness;Jegert G;J. Appl. Phys.,2011

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