Kinetics evaluation of passive oxidation at high temperature of silicon nitride used in the fabrication of lightweight metal matrix composites

Author:

López-López I. I.1,Contreras A.2,Morales-Estrella R.1,Lemus-Ruiz J.1

Affiliation:

1. Universidad Michoacana de San Nicolás de Hidalgo

2. Instituto Mexicano del Petróleo, CDMX

Abstract

Abstract In the present work, the passive oxidation kinetics of silicon nitride α-Si3N4 and (α + β)-Si3N4 powders at different temperatures from 1000 to 1200°C were evaluated. Oxidation of these powders was carried out to improve wettability and pressureless infiltration of AZ91E Mg-alloy. The oxidation kinetic constant (kp) values and oxide layer depth were calculated. The oxidation kinetic constants kp, were 9.11e− 16 and 6.35e− 16 kg2/m4s and the oxidation depth were 4.25 nm and 3.69 nm, for α-Si3N4 and (α + β)-Si3N4, respectively. Furthermore, passive surface oxidation of silicon nitride was performed in order to achieve affinity between silicon nitride and AZ91E magnesium alloy. Therefore, the manufacture of AZ91E/Si3N4 magnesium matrix composite materials was successfully achieved by spontaneous infiltration process at a temperature of 800°C.

Publisher

Research Square Platform LLC

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