Quantifying the Ultimate Limit of Plasmonic Near-field Enhancement

Author:

Zhang Shunping1ORCID,lu zhengyi,Ji Jiamin1,Ye Haiming1,Zhang Hao1,Xu Hongxing1ORCID

Affiliation:

1. School of Physics and Technology, Wuhan University

Abstract

Abstract

Quantitatively probing the ultimate limit of near-field enhancement around plasmonic nanostructures remains elusive, despite more than five decades since the discovery of surface-enhanced Raman scattering (SERS). Theoretical calculations have predicted an ultimate near-field enhancement exceeding 1000 using the best plasmonic material Ag, but experimental estimations disperse by orders of magnitude. Here, we design a high-quality Ag plasmonic nanocavity with atomic precision and precisely quantify the upper limit of near-field enhancement in ~ 1 nm junctions. A hot-spot averaged SERS enhancement of 4.29×1010 is recorded with a small fluctuation, corresponding to an averaged electric field enhancement larger than 1000 times. This result quantitatively delineates the ultimate limit of plasmonic field enhancement around plasmonic nanostructures, establishing a foundation for diverse plasmon-enhanced processes and strong light-matter interactions at the atomic scale.

Publisher

Research Square Platform LLC

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