Structural characterization of the nickel thin film deposited by glad technique-Reference-Cited by-同舟云学术

Structural characterization of the nickel thin film deposited by glad technique

Published:2013 Issue:1 Volume:45 Page:61-67
ISSN:0350-820X
Container-title:Science of Sintering
language:en
Short-container-title:SCI SINTER

Author:

Potocnik J.¹,Nenadovic M.¹,Jokic B.²,Strbac S.³,Rakocevic Z.¹

Affiliation:

1. INS Vinča, Laboratory of Atomic Physics, Belgrade

2. Faculty of Technology and Metallurgy, Belgrade

3. ICTM-Institute of Electrochemistry, Belgrade

Abstract

In this work, a columnar structure of nickel thin film has been obtained using an advanced deposition technique known as Glancing Angle Deposition. Nickel thin film was deposited on glass sample at the constant emission current of 100 mA. Glass sample was positioned 15 degrees with respect to the nickel vapor flux. The obtained nickel thin film was characterized by Force Modulation Atomic Force Microscopy and by Scanning Electron Microscopy. Analysis indicated that the formation of the columnar structure occurred at the film thickness of 1 ?m, which was achieved for the deposition time of 3 hours.

Funder

Ministry of Education, Science and Technological Development of the Republic of Serbia

Publisher

National Library of Serbia

Subject

Materials Chemistry,Metals and Alloys,Condensed Matter Physics,Ceramics and Composites

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