Optical properties of zigzag nickel nanostructures obtained at different deposition angles

Abstract

In this study, nickel (Ni) thin films were deposited at two different angles (65o and 85o) using Glancing Angle Deposition technique, to the thicknesses of 60 - 290 nm. Structural analysis of the deposited films was performed by scanning electron microscopy and X-ray diffraction, while spectroscopic ellipsometry was used for the investigation of optical properties. Electrical resitivity of the samples was determined by four-point probe method. Structural analysis showed that the Ni films grow in a shape of zigzag nanocolumns, where the deposition angle strongly affects their porosity. As the thickness of the films increase they absorb light strongly and become less dense. Besides, samples deposited at the angle of 85o exhibit higher values of electrical resistivity as compared to the samples deposited at the angle of 65o, which can be correlated with high porosity and the growth mechanism of the deposited nanostructures.