Numerical simulation of flow field in chemical vapor reactor for nanoparticle synthesized

Abstract

This paper provided a numerical simulation of fluid dynamics in the chemical vapor reactor for nanoparticle synthesis. Standard k-? turbulence equation and eddy-dissipation model with standard wall function were used to investigate the reaction process of turbulent diffusion for alumina production. Here the tempera?ture and the operating conditions are discussed. Numerical results show that the model can well describe synthesis of nanometer alumina. The chemical reactions for alumina by this reactor are mainly concentrated in the range of 200 mm after the nozzle. The materials are completely mixed after 400 mm in the reactor.