Development of a direct patterning method for functional oxide thin films using ultraviolet irradiation and hybrid-cluster gels and its application to thin-film transistor fabrication
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/11/i=4/a=046501/pdf
Reference10 articles.
1. High-Performance Solution-Processed Amorphous Zinc−Indium−Tin Oxide Thin-Film Transistors
2. A General Route to Printable High-Mobility Transparent Amorphous Oxide Semiconductors
3. Low-temperature, high-performance solution-processed metal oxide thin-film transistors formed by a ‘sol–gel on chip’ process
4. Rheology printing for metal-oxide patterns and devices
5. Impact of UV/O3 treatment on solution-processed amorphous InGaZnO4 thin-film transistors
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1. Fabrication of a p-type Cu2O thin-film via UV-irradiation of a patternable molecular-precursor film containing Cu(II) complexes;Journal of Crystal Growth;2019-03
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