Magnet-free uniform sputtering of dielectric film by RF and microwave power superposition-Reference-Cited by-同舟云学术

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Magnet-free uniform sputtering of dielectric film by RF and microwave power superposition

Published:2016-07-11 Issue:8 Volume:55 Page:086202
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Sasai Kensuke,Hagihara Toshiya,Noda Tomonori,Suzuki Haruka,Toyoda Hirotaka

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/55/i=8/a=086202/pdf

Reference35 articles.

1. Suppression of High-Energy Backscattered Particles in Magnetron Plasma Using Cylindrical Cathode

2. High-energy ions and atoms sputtered and reflected from a magnetron source for deposition of magnetic thin films

3. Generation processes of super-high-energy atoms and ions in magnetron sputtering plasma

4. Sputter process diagnostics by negative ions

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Microwave Plasma;RF Power Semiconductor Generator Application in Heating and Energy Utilization;2020

2. Enhancement of liquid treatment efficiency by microwave plasma under flow-induced reduced pressure;Japanese Journal of Applied Physics;2017-01-23

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