Durability to oxygen reactive ion etching enhanced by addition of synthesized bis(trimethylsilyl)phenyl-containing (meth)acrylates in ultraviolet nanoimprint lithography-Reference-Cited by-同舟云学术

Durability to oxygen reactive ion etching enhanced by addition of synthesized bis(trimethylsilyl)phenyl-containing (meth)acrylates in ultraviolet nanoimprint lithography

Published:2016-05-18 Issue:6S1 Volume:55 Page:06GM02
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Ito Shunya,Sato Hiroki,Tasaki Yuhei,Watanuki Kimihito,Nemoto Nobukatsu,Nakagawa Masaru

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/55/i=6S1/a=06GM02/pdf

Reference30 articles.

1. Mold-assisted nanolithography: A process for reliable pattern replication

2. Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturing

3. Nanoimprint lithography and future patterning for semiconductor devices

4. A route for fabricating printable photonic devices with sub-10 nm resolution

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