Effect of trench structure on reverse characteristics of 4H-SiC junction barrier Schottky diodes

Author:

Konishi Kumiko,Kameshiro Norifumi,Yokoyama Natsuki,Shima Akio,Shimamoto Yasuhiro

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Advanced Vertical Diamond Diodes with Trench Structure towards High Performances;2023 20th China International Forum on Solid State Lighting & 2023 9th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS);2023-11-27

2. High performance trench diamond junction barrier Schottky diode with a sidewall-enhanced structure;Chinese Physics B;2023-07-01

3. Design Space of GaN Vertical Trench Junction Barrier Schottky Diodes: Comprehensive Study and Analytical Modeling;Electronics;2022-06-24

4. A SiC sidewall enhanced trench JBS diode with improved forward performance;Semiconductor Science and Technology;2022-05-24

5. An ultrahigh-voltage 4H-SiC merged PiN Schottky diode with three-dimensional p-type buried layers;Journal of Central South University;2021-12

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