Preparation of TiN films by reactive high-power pulsed sputtering Penning discharges
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/57/i=6S2/a=06JE02/pdf
Reference31 articles.
1. Ionized physical vapor deposition (IPVD): A review of technology and applications
2. High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
3. High power impulse magnetron sputtering discharge
4. Electrical characteristics of arc-free high-power pulsed sputtering glow plasma
5. Electrical and Optical Characteristics of High-Power Pulsed Sputtering Glow Discharge
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Titanium Silicon Nitride Films With Low Silicon Content Deposited via Reactive High-Power Pulsed Sputtering Penning Discharge;IEEE Transactions on Plasma Science;2021-01
2. The Utilization of Carbon Dioxide to Prepare TiCxOy Films with Low Friction and High Anti-Corrosion Properties;Coatings;2020-05-30
3. Properties of titanium oxynitride films deposited on glass substrate by reactive high-power pulsed magnetron sputtering;Japanese Journal of Applied Physics;2020-02-26
4. Experimental Study of Inhomogeneous Reflex-Discharge Plasma Using Microwave Refraction Interferometry;Ukrainian Journal of Physics;2018-12-09
5. Preparation of titanium carbon nitride films by reactive high power pulsed sputtering Penning discharges;Vacuum;2018-11
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