Development of Direct Deep Reactive Ion Etching Process Using Laser Interference Lithographed Etch Barrier without Intermediate Layer-Reference-Cited by-同舟云学术

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Development of Direct Deep Reactive Ion Etching Process Using Laser Interference Lithographed Etch Barrier without Intermediate Layer

Published:2013-10-01 Issue:10S Volume:52 Page:10MC04
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Je Soonkyu,Shim Jongmyeong,Kim Joongeok,Kim Minsoo,Lee Jinhyung,Nho Heejin,Han Jungjin,Kim Seok-min,Kang Shinill

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference20 articles.

1. A novel high aspect ratio microfluidic design to provide a stable and uniform microenvironment for cell growth in a high throughput mammalian cell culture array

2. Micro grooving simulation and optimization in the roughing stage

3. Electron Beam Lithography on Organosilane Self-Assembled Monolayer Resist

4. Imprint lithography with sub-10 nm feature size and high throughput

5. Injection Molding of Nanopillars for Perpendicular Patterned Magnetic Media with Metallic Nanostamp

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Interference system for high pressure environment;Optics & Laser Technology;2021-10

2. Uniform and Anti-Reflective Nano Coating on a Cylinder for Fabricating a Cylindrical Nano Mold;Nanoscience and Nanotechnology Letters;2018-09-01

3. Real-Time Compensation of Simultaneous Errors Induced by Optical Phase Difference and Substrate Motion in Scanning Beam Laser Interference Lithography System;IEEE/ASME Transactions on Mechatronics;2018-08

4. Design methodology for nano-engineered surfaces to control adhesion: Application to the anti-adhesion of particles;Applied Surface Science;2016-12

5. Alignment method combining interference lithography with anisotropic wet etch technique for fabrication of high aspect ratio silicon gratings;Optics Express;2014-09-18

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