Effects of Side Surface Roughness on Carrier Mobility in Tri-Gate Single Silicon Nanowire Metal–Oxide–Semiconductor Field-Effect Transistors
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference41 articles.
1. Experimental evidence for quantum mechanical narrow channel effect in ultra-narrow MOSFET's
2. Electron Mobility in Silicon Gate-All-Around [100]- and [110]-Directed Nanowire Metal–Oxide–Semiconductor Field-Effect Transistor on (100)-Oriented Silicon-on-Insulator Substrate Extracted by Improved Split Capacitance–Voltage Method
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2. Creation and Evaluation of Atomically Ordered Side- and Facet-Surface Structures of Three-Dimensional Silicon Nano-Architectures;21st Century Surface Science - a Handbook;2020-11-26
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4. Electric transport properties for three-dimensional angular-interconnects of Au wires crossing facet edges of atomically-flat Si{111} surfaces;Japanese Journal of Applied Physics;2018-07-26
5. A Simple Interpolation Model for the Carrier Mobility in Trigate and Gate-All-Around Silicon NWFETs;IEEE Transactions on Electron Devices;2017-06
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