Deposition of Cluster-Free B-doped Hydrogenated Amorphous Silicon Films Using SiH4+B10H14Multi-Hollow Discharge Plasma Chemical Vapor Deposition-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Deposition of Cluster-Free B-doped Hydrogenated Amorphous Silicon Films Using SiH4+B10H14Multi-Hollow Discharge Plasma Chemical Vapor Deposition

Published:2012-01-01 Issue:1S Volume:51 Page:01AD03
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Koga Kazunori,Nakahara Kenta,Kim Yeon-Won,Matsunaga Takeaki,Yamashita Daisuke,Matsuzaki Hidefumi,Uchida Giichiro,Kamataki Kunihiro,Itagaki Naho,Shiratani Masaharu

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference41 articles.

1. Photovoltaic Technology: The Case for Thin-Film Solar Cells

2. Potential of amorphous silicon for solar cells

3. Advances in plasma-enhanced chemical vapor deposition of silicon films at low temperatures

4. Thin-Film Silicon –Growth Process and Solar Cell Application–

5. Present Status and Future Prospects of Silicon Thin-Film Solar Cells

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP