Characteristics of TiO2Thin Film Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasmas-Reference-Cited by-同舟云学术

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Characteristics of TiO2Thin Film Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasmas

Published:2012-08-01 Issue:8S1 Volume:51 Page:08HB04
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kawakami Retsuo,Niibe Masahito,Takeichi Atsushi,Mori Yuta,Konishi Masashi,Kotaka Takuya,Matsunaga Fumihiko,Takasaki Toshihide,Kitano Takanori,Miyazaki Takahiro,Inaoka Takeshi,Tominaga Kikuo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference30 articles.

1. Nitridation of nanocrystalline TiO2 thin films by treatment with ammonia

2. Comparative study of the structural, optical and photocatalytic properties of semiconductor metal oxides toward degradation of methylene blue

3. Photoelectrochemical and optical properties of N-doped TiO2 thin films prepared by oxidation of sputtered TiNx films

4. Low-voltage driven visible and infrared electroluminescence from light-emitting device based on Er-doped TiO2/p+-Si heterostructure

5. Deposition of Photocatalytic TiO2 Films by Planar Magnetron Sputtering System with Opposed Ti Targets

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1. Effect of N2/Ar plasma treatment on the visible light photocatalytic activity of CuO/TiO2;Chinese Journal of Catalysis;2014-10

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