Lifetime of Molecular Nitrogen at Metastable A3Σu+State in Afterglow of Inductively-Coupled Nitrogen Plasma-Reference-Cited by-同舟云学术

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Lifetime of Molecular Nitrogen at Metastable A3Σu+State in Afterglow of Inductively-Coupled Nitrogen Plasma

Published:2012-12-01 Issue:12R Volume:51 Page:126301
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Horikawa Yoshimine,Hayashi Toshio,Sasaki Koichi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference32 articles.

1. Time-resolved LIF spectroscopy on N2(A) metastable in a He/N2 pulsed rf discharge

2. Effective Species in Inductively Coupled Nitrogen Plasma for Silicon Nitriding

3. Plasma etching—A discussion of mechanisms

4. Quantitative and comparative characterizations of plasma process-induced damage in advanced metal-oxide-semiconductor devices

5. Chemical dry etching of silicon nitride and silicon dioxide using CF4/O2/N2 gas mixtures

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1. Introduction to Plasma and Plasma Diagnostics;Non-Thermal Plasma Technology for Polymeric Materials;2019

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