Thin Film Optical Circuit Fabrication Using a CO2Laser-Reference-Cited by-同舟云学术

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Thin Film Optical Circuit Fabrication Using a CO2Laser

Published:1980-01-01 Issue:S1 Volume:19 Page:451
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Terui Hiroshi,Kobayashi Morio

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Carbon-dioxide-laser processing of porous glass layers for optical waveguides;Applied Optics;1985-02-15

2. Refractive index and attenuation characteristics of SiO_2–Ta_2O_5 optical waveguide film;Applied Optics;1983-10-01

3. Total reflection optical waveguide switching through dielectric chip motion;Applied Optics;1981-09-15

4. Refractive index decrease phenomena in SiO2–Ta2O5waveguide films by CO2laser irradiation;Journal of Applied Physics;1981-09

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