Sequential infiltration synthesis- and solvent annealing-induced morphological changes in positive-tone e-beam resist patterns evaluated by atomic force microscopy-Reference-Cited by-同舟云学术

Sequential infiltration synthesis- and solvent annealing-induced morphological changes in positive-tone e-beam resist patterns evaluated by atomic force microscopy

Published:2019-05-06 Issue:SD Volume:58 Page:SDDJ04
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Ozaki Yuki,Ito Shunya,Nakamura Takahiro,Nakagawa Masaru

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

https://iopscience.iop.org/article/10.7567/1347-4065/ab0496/pdf

Reference32 articles.

1. Electron beam lithography

2. Electron beam lithography in nanoscale fabrication: recent development

3. High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution

4. Mold-assisted nanolithography: A process for reliable pattern replication

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