Evaluation of Particle Protection Capability of Extreme Ultraviolet Lithography Mask Carrier in Vacuum Transfer by Experiment and Calculation-Reference-Cited by-同舟云学术

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Evaluation of Particle Protection Capability of Extreme Ultraviolet Lithography Mask Carrier in Vacuum Transfer by Experiment and Calculation

Published:2011-09-01 Issue:9R Volume:50 Page:096701
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Amemiya Mitsuaki,Ota Kazuya,Taguchi Takao,Suga Osamu

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference33 articles.

1. Extreme ultraviolet lithography: Status and prospects

2. Selete's EUV program: progress and challenges

3. EUV mask blank readiness for 45-nm HP 2009 manufacturing

4. Extreme Ultraviolet Lithography Development in the United States

5. High transmission pellicles for extreme ultraviolet lithography reticle protection

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2. Design and characterization of MEMS optical devices using slot-ring resonator for low-voltage operation;Japanese Journal of Applied Physics;2016-03-29

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