Nonlinear Behavior of Decrease in Reflectivity of Multilayer Mirrors for Extreme Ultraviolet Lithography Optics by High-Flux Extreme Ultraviolet Irradiation in Various Vacuum Environments-Reference-Cited by-同舟云学术

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Nonlinear Behavior of Decrease in Reflectivity of Multilayer Mirrors for Extreme Ultraviolet Lithography Optics by High-Flux Extreme Ultraviolet Irradiation in Various Vacuum Environments

Published:2011-06-01 Issue:6S Volume:50 Page:06GB05
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Niibe Masahito,Koida Keigo,Kakutani Yukinobu,Nakayama Takahiro,Terashima Shigeru,Miyake Akira,Kubo Hiroyoshi,Matsunari Shuichi,Aoki Takashi,Kawata Shintaro

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference21 articles.

1. Progress of the EUVL alpha tool

2. Radiation-induced protective carbon coating for extreme ultraviolet optics

3. Design and performance of capping layers for extreme-ultraviolet multilayer mirrors

4. Modeling radiation-induced carbon contamination of extreme ultraviolet optics

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