Modelling the threshold voltage of p‐channel enhancement‐mode GaN heterostructure field‐effect transistors
Author:
Affiliation:
1. Department of Electronic and Electrical EngineeringUniversity of SheffieldGeorge Porter Building, Broad LaneSheffieldUK
Publisher
Institution of Engineering and Technology (IET)
Subject
Electrical and Electronic Engineering
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1049/iet-pel.2017.0438
Reference24 articles.
1. GaN-Based RF Power Devices and Amplifiers
2. 2016 2016 IEEE Int. Electron Devices Meeting (IEDM) D. Shibata R. Kajitani M. Ogawa 1.7 kV/1.0 m Ω cm 2 normally off vertical GaN transistor on GaN substrate with regrown p‐GaN/AlGaN/GaN semipolar gate structure 10.1.1 10.1.4
3. Gate-First AlGaN/GaN HEMT Technology for High-Frequency Applications
4. 2016 2016 IEEE Int. Electron Devices Meeting (IEDM) H. Ishida R. Kajitani Y. Kinoshita GaN‐based semiconductor devices for future power switching systems 20.4.1 20.4.4
5. GaN-Based Super Heterojunction Field Effect Transistors Using the Polarization Junction Concept
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