Modelling the threshold voltage of p‐channel enhancement‐mode GaN heterostructure field‐effect transistors

Author:

Kumar Ashwani1ORCID,De Souza Maria Merlyne1

Affiliation:

1. Department of Electronic and Electrical EngineeringUniversity of SheffieldGeorge Porter Building, Broad LaneSheffieldUK

Publisher

Institution of Engineering and Technology (IET)

Subject

Electrical and Electronic Engineering

Reference24 articles.

1. GaN-Based RF Power Devices and Amplifiers

2. 2016 2016 IEEE Int. Electron Devices Meeting (IEDM) D. Shibata R. Kajitani M. Ogawa 1.7 kV/1.0 m Ω cm 2 normally off vertical GaN transistor on GaN substrate with regrown p‐GaN/AlGaN/GaN semipolar gate structure 10.1.1 10.1.4

3. Gate-First AlGaN/GaN HEMT Technology for High-Frequency Applications

4. 2016 2016 IEEE Int. Electron Devices Meeting (IEDM) H. Ishida R. Kajitani Y. Kinoshita GaN‐based semiconductor devices for future power switching systems 20.4.1 20.4.4

5. GaN-Based Super Heterojunction Field Effect Transistors Using the Polarization Junction Concept

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