Effective improvement in the etching characteristics of Si{110} in low concentration TMAH solution-Reference-Cited by-同舟云学术

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Effective improvement in the etching characteristics of Si{110} in low concentration TMAH solution

Published:2018-08 Issue:8 Volume:13 Page:1085-1089
ISSN:1750-0443
Container-title:Micro & Nano Letters
language:en
Short-container-title:Micro & Nano Letters

Author:

Swarnalatha Veerla¹,Narasimha Rao Avvaru Venkata¹,Pal Prem¹

Affiliation:

1. MEMS and Micro/Nano Systems LaboratoryDepartment of PhysicsIndian Institute of Technology HyderabadHyderabadIndia

Publisher

Institution of Engineering and Technology (IET)

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,Bioengineering

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1049/mnl.2017.0610

Reference61 articles.

1. Silicon Wet Bulk Micromachining for MEMS

2. Bulk micromachining of silicon

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1. Inverted pyramid structures fabricated on monocrystalline silicon surface with a NaOH solution;Heliyon;2024-01

2. High Speed Etching of Silicon in NaOH-Based Solution;Springer Proceedings in Physics;2024

3. Wet anisotropic etching characteristics of Si{111} in NaOH-based solution for silicon bulk micromachining;Micro and Nano Systems Letters;2022-12-01

4. Etching Characteristics of Si{110} in NaOH Based Solution;Microactuators, Microsensors and Micromechanisms;2022-11-21

5. Enhanced etching characteristics of Si{100} in NaOH-based two-component solution;Micro and Nano Systems Letters;2022-08-01

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