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High-Q on-chip inductors using extremely thick silicon dioxide and copper-damascene technology

  • Published:2008 Issue:3 Volume:44 Page:241
  • ISSN:0013-5194
  • Container-title:Electronics Letters
  • language:en
  • Short-container-title:Electron. Lett.

Author:

Tang M.,Li H.Y.,Zhang Q.X.,Liao E.B.,Yu A.B.,Lo G.Q.,Balasubramanian N.,Kwong D.L.

Publisher

Institution of Engineering and Technology (IET)

Subject

Electrical and Electronic Engineering

Reference6 articles.

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Microtransformer on silicon with CoFeB magnetic core for high-frequency signal applications;AIP Advances;2020-01-01

2. Fabrication of silicon-embedded low resistance high-aspect ratio planar copper microcoils;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-01-09

3. Application of Ferrite Nanomaterial in RF On-Chip Inductors;Journal of Nanomaterials;2013

4. A CMOS compatible Microbulk Micromegas-like detector using silicon oxide as spacer material;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2011-02

5. Self-assembly of three-dimensional Au inductors on silicon;IET Microwaves, Antennas & Propagation;2010
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