Properties of indium tin oxide films deposited by RF magnetron sputtering at various substrate temperatures
Author:
Publisher
Institution of Engineering and Technology (IET)
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,Bioengineering
Link
https://digital-library.theiet.org/content/journals/10.1049/mnl.2012.0454?crawler=true&mimetype=application/pdf
Reference12 articles.
1. Transparent conductors as solar energy materials: A panoramic review
2. Properties of indium tin oxide films prepared by rf reactive magnetron sputtering at different substrate temperature
3. Low temperature deposition of ITO thin films by ion beam sputtering
4. Oxidation process in pulsed laser ablation of Si with various ambients
5. Effect of substrate temperature on the growth of ITO thin films
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1. Effect of oxygen flow on electrical and optical properties of ITO films synthesized by magnetron sputtering method;Herald of the Kazakh-British technical university;2023-12-12
2. DC sputtered iron-doped indium saving indium tin oxide thin films using Fe 3 O 4 target;Molecular Crystals and Liquid Crystals;2023-07-04
3. Multilayer indium saving ITO thin films produced by sputtering method;Journal of Alloys and Compounds;2020-06
4. Plasma-assisted chemical vapor synthesis of indium tin oxide (ITO) nanopowder and hydrogen-sensing property of ITO thin film;Materials Research Express;2018-06-26
5. Structural, optical and electrical properties of DC sputtered indium saving indium-tin oxide (ITO) thin films;Optik;2018-03
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