Research on seamless image stitching based on fast marching method

Abstract

AbstractImage stitching is an important way to achieve large‐field high‐resolution imaging. The inconsistencies in brightness and structure and defects in ghosting, blurring and misalignment between images, which are inevitable and difficult to eliminate, make a challenge to image stitching, due to the external lighting environment and changes in camera pose and parameters. Here, a novel method is proposed to search for the optimal seamline based on the fast marching method, which can stitch large parallax images with high quality. A feature weight map is first formed based on the similarity in colour, edge, texture and saliency of the images. Then it is used as the cost value of the seamline to search for the optimal seamline by fast marching method. The results show that this new method is more efficient to reduce defects, such as ghosting, misalignment and chromatic aberration, and realize high quality image stitching compared with traditional stitching tools and methods, which provides a new perspective for image stitching technology.