A novel field plate with arcuate end for improving GaN HEMTs

Author:

Cheng Junji1ORCID,Liu Jiaping1,Luo Yuanjie2,He Gongtao2,Meng Fanxin3,He Zhaofeng3,Yi Bo1ORCID,Huang Haimeng1,Yang Hongqiang1,Wang Zhiming1

Affiliation:

1. University of Electronic Science and Technology of China Chengdu China

2. 24th Research Institute of China Electronics Technology Group Corporation Chongqing China

3. Chengdu High‐Tech Development Co., Ltd. Chengdu China

Abstract

AbstractA new field plate (FP) is proposed for gallium nitride high‐electron‐mobility transistors (HEMTs). It features an innovative arcuate end (AE), which allows the induced charges that originally gathered at the FP end to diffuse over a wider area. Hence, not only is the electric field in the channel at the gate edge alleviated due to the induced charges, but also that concentrated at the FP end is reduced by means of AE. The simulation results indicate that by upgrading a source FP with AE, HEMT gains a 99% increase in breakdown voltage while remaining unaltered in specific on‐resistance. It also gets a 43.41% decrease in power loss during one cycle while maintaining the same breakdown voltage, which greatly contributes to enhance the efficiency of power electronic circuits.

Funder

China Postdoctoral Science Foundation

Publisher

Institution of Engineering and Technology (IET)

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