Origins of Wear-Induced Tungsten Corrosion Defects in Semiconductor Manufacturing During Tungsten Chemical Mechanical Polishing-Reference-Cited by-同舟云学术

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Origins of Wear-Induced Tungsten Corrosion Defects in Semiconductor Manufacturing During Tungsten Chemical Mechanical Polishing

Published:2022 Issue: Volume: Page:
ISSN:1556-5068
Container-title:SSRN Electronic Journal
language:en
Short-container-title:SSRN Journal

Author:

Choi Seung-Hoon,Kreider Melissa E.,Nielander Adam C.,Burke Stevens Michaela,Kamat Gaurav Ashish,Koo Ja Eung,Bae Ki Ho,Kim Hoyoung,Yoon Il Young,Yoon Bo Un,Hwang Kihyun,Lee Dong Un,Jaramillo Thomas F.

Publisher

Elsevier BV

Subject

General Earth and Planetary Sciences,General Environmental Science

Reference29 articles.

1. An overview of corrosion–wear interaction for planarizing metallic thin films

2. Modeling the Electrical Effects of Metal Dishing Due to CMP for On-Chip Interconnect Optimization

3. Electrochemical Stability of Tungsten and Tungsten Monocarbide (WC) Over Wide pH and Potential Ranges

4. Electrochemical mechanism of layout-dependent corrosion of tungsten in contact plugs

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