Atomistic Mechanisms of Sic Electrochemical Mechanical Polishing in Aqueous H2o2: Molecular Dynamics Simulations Using Reaxff Reactive Force Field

Author:

Zhu Rui,Cheng Feng,Yao Qingyu,Wang Zirui,Wang Yongguang,Lu Xiaolong,Huang Dongmei,Zhao Yongwu

Publisher

Elsevier BV

Reference50 articles.

1. Dislocations in 4H silicon carbide;J Li;Journal of Physics D: Applied Physics,2022

2. Comparison of 3C-SiC, 6H-SiC and 4H-SiC MESFETs performances;C Codreanu;Materials Science in Semiconductor Processing,2000

3. Charge Utilization Efficiency and Side Reactions in the Electrochemical Mechanical Polishing of 4H-SiC (0001);X Yang;Journal of The Electrochemical Society,2022

4. Polishing process of 4H-SiC under different pressures in a water environment;Y Zhou;Diamond and Related Materials,2023

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