Fabrication of High-Critical Current Density Nb/Al-Aln/Nb Junctions with an Aln Barrier Deposited by Dc Magnetic Reactive Sputtering

Author:

Zhang Xue,Wu Xiangge,Ying Liliang,Ma Linxian,Shi Weifeng,Xie Hui,Peng Wei,Ren Jie

Publisher

Elsevier BV

Reference17 articles.

1. Degradation of superconducting tunnel junction characteristics with increasing barrier transparency;A W Kleinsasser;Applied Physics Letters

2. Properties of Unshunted and Resistively Shunted Nb/AlO x -Al/Nb Josephson Junctions With Critical Current Densities From 0.1 to 1 mA/?m 2;S K Tolpygo;IEEE Transactions on Applied Superconductivity,2017

3. Uniformity and Reproducibility of Submicron 20 kA/cm� Nb/AlO x /Nb Josephson Junction Process;S Nagasawa;2015 15th International Superconductive Electronics Conference (ISEC),2015

4. Film Stress Influence on Nb/Al-AlO x /Nb Josephson Junctions;Y Wu;IEEE Transactions on Applied Superconductivity,2019

5. Tunnel barrier growth dynamics of Nb/AlO x -Al/Nb and Nb/A1N x -Al/Nb Josephson junctions;R Dolata;Physica C: Superconductivity,1995

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