Alteration and Interrogation of Ultra-Thin Layer of Silicon by Reactive Molecular Ion Implantation

Author:

Mukherjee Joy,Bhowmick Sudip,Karmakar Sabyasachi,Bhowmik Dipak,Satpati Biswarup,Hazra Satyajit,Karmakar Prasanta

Publisher

Elsevier BV

Reference51 articles.

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2. Review-Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: State-of-the-Art Processing Technologies, Properties, and Applications;A E Kaloyeros;ECS Journal of Solid State Science and Technology,2020

3. Nonlinear optics on silicon-rich nitride-a high nonlinear figure of merit CMOS platform;D T H Tan;Photonic research,2018

4. On the Mechanical Response of Silicon Dioxide Nanofiller Concentration on Fused Filament Fabrication 3D Printed Isotactic Polypropylene Nanocomposites;N Vidakis;Polymers,2021

5. The Performance and Reliability of PMOSFET's with Ultrathin Silicon Nitride/Oxide Stacked Gate Dielectrics with Nitrided Si-SiO2 Interfaces Prepared by Remote Plasma Enhanced CVD and Post-Deposition Rapid Thermal Annealing;Y Wu;IEEE Transaction on Electron Devices,2000

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