Ultra-High Photosensitivity of Nb2o5/Si Prepared by Direct Current Reactive Magnetron Sputtering Technique

Author:

Hathal Yahia,Ibrahim Isam,Khalaf Mohammed,Sabbar Ehsan

Publisher

Elsevier BV

Reference37 articles.

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3. Growth of NbO, NbO2 and Nb2O5 thin films by reactive magnetron sputtering and post-annealing;E G Fridriksson;Vacuum,2022

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