1. S2E simulation of an ERL-based high-power EUV-FEL source for lithography;N Nakamura;J. Phys.: Conf. Ser,2017
2. Demonstration of proof of concept of the EUV-FEL for future lithography;T Shimada;International Conference on Extreme Ultraviolet Lithography 2021,2021
3. Construction and commissioning of cERL IR-FEL for realizing the EUV-FEL for future lithography;T Shimada;Optical and EUV Nanolithography XXXV,2022