The role of Si impurities in the transient dopant segregation and precipitation in yttrium-doped alumina

Author:

Šturm Sašo1,Gülgün Mehmet A.2,Richter Gunther3,Morales Francisco M.4,Cannon Rowland M.5,Rühle Manfred3

Affiliation:

1. Jožef Stefan Institute, Department for Nanostructured Materials, Ljubljana, Slovenia

2. Sabanci University, FENS, Tuzla, Istanbul, Turkey

3. Max-Planck-Institute für Metallforschung, Stuttgart, Germany

4. Universidad de Cadiz, Puerto Real, Spain

5. MSD, Lawrence Berkeley National Laboratory, Berkeley, U. S. A.

Abstract

Abstract Y-doped alumina was sintered at 1500°C for 10 h under ultra-clean experimental conditions without experiencing any abnormal grain growth. The yttrium was fairly homogeneously distributed at the grain boundaries, with a mean value of Y = 5.5 at nm−2. The Y–Al–O precipitates in the clean, Y2O3-doped alumina specimen were the YAP (YAlO3) phase, whereas only the YAG (Y3Al5O12) phase was present in the Y2O3-doped alumina samples contaminated with SiO2. The excess concentrations of Y and Si atoms at the grain boundaries that, at the same time, provoke the formation of structurally complex YAG precipitates and abnormal grain growth were both estimated to be at 4–5 at nm−2. The compositions of the triple point pocket phases found in the region of the exaggeratedly grown alumina grains indicate the presence of alumino-silicate bulk liquids at the sintering temperature.

Publisher

Walter de Gruyter GmbH

Subject

Materials Chemistry,Metals and Alloys,Physical and Theoretical Chemistry,Condensed Matter Physics

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