Microstructure Preparation Using Glow Discharge Plasma Taking the Examples of Ni-Ti, Cu-Zn and a Ni-Based Alloy

Abstract

Abstract The present work investigates the universal applicability of glow discharge plasmas for the microstructure representation of different materials taking the example of Ni-Ti alloys, Cu-Zn alloys, and the Ni based alloy “Hastelloy C 276”. Results are compared with the results provided by classical etching methods. Microstructures became visible for the previously mechanically polished materials within a few seconds, even without detailed optimization of the excitation conditions of the glow discharge plasma. The results partially significantly outperfomed the results of the classical preparation techniques with respect to the detectability of structural details such as grain and phase boundaries. Due to the demonstrated wide and relatively uncomplicated applicability, the per se established glow discharge technology is expected to have a huge potential for application for a rapid and high-contrast microstructure representation.