Improving the stoichiometry of RF-sputtered amorphous alumina thin films by thermal annealing
Author:
Affiliation:
1. Department of Physics , Federal University of Technology, Minna , Nigeria
2. Department of Physics , University of Ibadan, Ibadan , Nigeria
Abstract
Publisher
Walter de Gruyter GmbH
Subject
Materials Chemistry,Metals and Alloys,Physical and Theoretical Chemistry,Condensed Matter Physics
Link
https://www.degruyter.com/document/doi/10.3139/146.111205/pdf
Reference65 articles.
1. Properties of aluminium oxide thin films deposited by reactive magnetron sputtering
2. Surface characterization of thin layers of aluminium oxide
3. Characterization of α-Al2O3, κ-Al2O3, and α-κ multioxide coatings on cemented carbides
4. Structural, optical and mechanical properties of amorphous and crystalline alumina thin films
5. Thermal Stability and Phase Transformations ofγ-/Amorphous-Al2O3Thin Films
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Optical and microstructural properties of neutron irradiated RF- sputtered amorphous alumina thin films;Optik;2017-04
2. He+ induced changes in the surface structure and optical properties of RF-sputtered amorphous alumina thin films;Journal of Non-Crystalline Solids;2016-01
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