An Automatic Modeling System of the Calculation Process of a CVD Film Deposition Simulator
Author:
Affiliation:
1. Department of Electrical and Electronic Engineering, Faculty of Engineering, Shizuoka University
2. Department of Chemical System Engineering, School of Engineering, The University of Tokyo
Publisher
Society of Chemical Engineers, Japan
Subject
General Chemical Engineering,General Chemistry
Link
http://www.jstage.jst.go.jp/article/jcej/43/11/43_10we003/_pdf
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1. Reaction analysis for ZrO2 and Y2O3 thin film growth by low-pressure metalorganic chemical vapor deposition using β-diketonate complexes
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3. Comparative molecular field analysis (CoMFA) of phthalazine derivatives as phosphodiesterase IV inhibitors
4. Micro/macro modeling of CVD synthesis
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