Preparation and Characterization of TiO2 Thin Films on Silica Gel Powders by Plasma Enhanced Chemical Vapor Deposition in a Circulating Fluidized Bed Reactor-Reference-Cited by-同舟云学术

Preparation and Characterization of TiO2 Thin Films on Silica Gel Powders by Plasma Enhanced Chemical Vapor Deposition in a Circulating Fluidized Bed Reactor

Published:2008 Issue:7 Volume:41 Page:700-704
ISSN:0021-9592
Container-title:JOURNAL OF CHEMICAL ENGINEERING OF JAPAN
language:en
Short-container-title:J. Chem. Eng. Japan

Author:

Kim Gook Hee¹,Kim Sang Done¹,Park Soung Hee²

Affiliation:

1. Department of Chemical and Biomolecular Engineering, Energy and Environment Research Center, Korea Advanced Institute of Science and Technology

2. Department of Cosmetics & Chemical Engineering, Woosuk University

Publisher

Society of Chemical Engineers, Japan

Subject

General Chemical Engineering,General Chemistry

Link

http://www.jstage.jst.go.jp/article/jcej/41/7/41_07WE109/_pdf

Reference18 articles.

1. Plasma Enhanced Chemical Vapor Deposition on Powders in a Low Temperature Plasma Fluidized Bed

2. Frenck, H. J., W. Kulisch, M. Kuhr and R. Kassing; “Deposition of TiO₂ Thin Films by Plasma Enhanced Decomposition of Tetra-Isopropyltitanate,” Thin Solid Film, 201, 327–335 (1991)

3. Fujishima, A., K. Hashimoto and T. Watanabe; TiO₂ Photocatalysis. p. 124, BKC, Toyko, Japan (1999)

4. Grace, J. R. and H. Bi eds.; Circulating Fluidized Beds, pp. 1–20, Blackie Academic and Professional, London, U.K. (1997)

5. Guillard, C., D. Debayle, A. Gagnaire, H. Jaffrezic and J. M. Herrmann; “Physical Properties and Photocatalytic Efficiencies of TiO₂ Films Prepared by PECVD and Sol–Gel Methods,” Mat. Res. Bull., 39, 1445–1458 (2004)

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