Machine learning-based off-line electrical characteristic prediction through in-line pattern integrity inspection

Author:

Liu Ting-Jeng,Wu Meng-Jhu,Lo Cheng-YaoORCID

Abstract

Abstract In this study, an image inspection method was introduced to two-arm Archimedean spiral antenna patterns to quantify and qualify their in-line integrity, which was linked to their off-line electrical characteristics in terms of the capacitance values through machine learning. The pattern was intentionally deteriorated in shape to imitate potential fabrication variations existing in the microelectronic production line, and six physical features including the inner line edge roughness (LER), outer LER, integrated LER, inner arm length, outer arm length, and arm area were collected. Two groups of training and testing samples were simulated and fabricated. Based on Gaussian process regression with the covariance function in the form of a squared exponential, a model was developed to predict the capacitance values from the performances of the six features. The accuracy of the developed model was evaluated using the coefficient of determination and root-mean-square error. The results indicate that the developed model is capable of predicting the off-line electrical characteristics of microelectronic components based on their in-line pattern integrities. Advanced studies also reveal that although all LER values and arm lengths contribute to the electrical characteristics, the arm area is decisive.

Funder

Ministry of Science and Technology, Taiwan

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. Impact of line-width roughness on Intel’s 65-nm process devices;Chandhok,2007

2. Electrical impact of line-edge roughness on sub-45-nm node standard cells;Ban;J. Micro Nanolithogr. MEMS MOEMS,2010

3. Time and frequency domain analysis of MLGNR interconnect;Kumar;IEEE Trans. Nanotechnol.,2015

4. New world of CD-SEM in utilization of design data;Kawata;Hitachi Rev.,2006

5. Methodology for evaluating pattern transfer completeness in inkjet printing with irregular edges;Huang;J. Micromech. Microeng.,2016

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3