Lithographically patternable SU-8/Graphene nanocomposite based strain sensors for soft-MEMS applications

Abstract

Abstract This paper presents an optimized, lithographically patternable SU-8/Graphene nanocomposite based piezoresistive strain sensor for localized, high-precision assessment, which marks a significant advancement in the field of soft-MEMS based technologies. The fabrication process involves the photolithography of a SU-8/Graphene nanocomposite with a minimum resolution of 50 μm, resulting in a material with excellent electrical conductivity and mechanical properties. Specifically, a 3% SU-8/Graphene composition was chosen to exceed the percolation threshold, enabling substantial changes in the resistance %Δ R / R and facilitating photopatternability. The sensor exhibited exceptional performance characteristics, including a rapid response time of 0.1 s and a wide bending range from 0° to 60°. Notably, it demonstrated a remarkable %ΔR/R of 19.21, indicating its superior sensing capability. Such high sensitivity is crucial for applications that require precise, localized measurements, such as biomedical engineering, sports science, and smart healthcare.