A kinetic model for photoenhanced organometallic chemical vapour deposition
Author:
Publisher
IOP Publishing
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0268-1242/8/i=6/a=017/pdf
Reference30 articles.
1. Gas‐Phase and Surface Reaction Mechanisms in MOCVD of GaAs with Trimethyl‐Gallium and Arsine
2. Laser enhanced metalorganic chemical vapor deposition crystal growth in GaAs
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. The role of the substrate in photoenhanced metalorganic chemical vapor deposition;Applied Physics Letters;1995-01-16
2. Selective growth of GaAs/InGaP heterostrusctures by photo-enhanced organomettalic chemical vapor deposition;Journal of Crystal Growth;1994-01
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