Self-images contrast enhancement for displacement Talbot lithography by means of composite mesoscale amplitude-phase masks
Author:
Publisher
IOP Publishing
Subject
Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1088/2040-8986/ab5b7d/pdf
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1. Phase gratings with subwavelength structures
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5. Adaptive wavefront sensor based on the Talbot phenomenon
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