Preparation and characterization of titanium dioxide using PLD at various energy of pulsed laser

Abstract

Abstract Because of its distinctive optical and electrical characteristics, titanium dioxide (TiO2) thin films are one of the significant and promising semiconductor materials for environmental and energy applications. The effect of the laser pulse energy of Nd:YAG on the properties of TiO2 thin film grown on silicon and quartz substrates using the laser pulse deposition technique by the crystal structure, surface area, crystalline structure, average particle size, and porosity were summarised. The nano-thin film with the optimum condition has been prepared with a pulse laser energy of 900 mJ. The optical properties have been investigated using UV–vis spectrophotometer, morphological properties have been studied using atomic force microscopy and field emission scanning electron microscopy, and structural properties have been examined using x-ray diffractometer and Raman spectrometer. The tests and measurements have shown a crystalline structure, and the distribution of the grains was regular in the film. Raman spectroscopy showed two diffraction peaks corresponding to anatase Eg and rutile Eg. This observation is typically used in dye-sensitised solar cells, separation sensor devices, and more.